Imago's LEAP microscope product line combines 3D atomic-scale structural information (similar to TEM) with elemental composition (similar to SIMS). The LEAP microscope provides the fastest, most comprehensive analysis of materials at the atomic scale. Imago's LEAP microscope product line is currently instrumental in cutting edge research in many fields and industries including Metallurgy, Data Storage, Semiconductors and Advanced Materials.

Imagos Atom Probe product lines utilize novel and proprietary ion optics to provide our customers with a quantum leap improvement over traditional atom probe microscopy. While atom probe microscopy has long been a productive scientific field of study, it is the advanced ion optics within Imagos products which have led to the rapid growth of the atom probe technique. The LEAP Si and LEAP HR have enabled breakthroughs in every key instrument performance metric including: data rate, mass resolution, later and vertical resolution, and field of view. Scientist and engineers from diverse disciplines, ranging from semiconductor failure analysis to metallurgy to polymer chemisty, are utilizing Imago Atom Probe Microscopes in their work.

The LEAP Si Metrology System is a high performance atom probe microscope providing 3D, atomic resolution, compositional imaging and analysis to research and industry. Materials are examined by removing and analyzing individual atoms. Atoms are removed by a combination of a high electrical field and either (1) an ultra fast voltage pulse or (2) an ultra fast laser pulse. The LEAP Si employs patented innovations that unlock the power of the 3D atom probe to address previously unsolved measurement challenges in semiconductor, material science and nanomagentics. Key features include: largest field of view, highest data rate, excellent mass resolution, and simplified sample preparation using microtip arrays. With the LEAP Si measurements that would have taken months, or been completely impossible, can be accomplished in a matter of hours.

The LEAP HR is a high performance atom probe microscope providing atomic resolution, 3D compositional imaging, and analysis to research and industry. Materials are examined by removing and analyzing individual atoms. Atoms are removed by a combination of a high electric field and either (1) an ultra fast voltage pulse or (2) an ultra fast laser pulse. Each ion is analyzed by measuring the time of flight to the detector through an energy compensated time of flight mass specrometer. The LEAP HR employs patented innovations that provide best in class mass resolution while simulaneously enabling a large field of view (> 150 nm). This combination of of high mass resolution with large field of view provides breakthrough capability for advanced materials applications. The large field of view enables the material's atomic scale features to be understood in the context of the larger scale nanostructure. High resolution premits narrowly separated mass peaks to be differentiated, ensuring accurate compositional information.